Development of Durable MTJ Under Harsh Environment for STT-MRAM at 1Xnm Technology Node (IMAGE)

Tohoku University

Development of Durable MTJ Under Harsh Environment for STT-MRAM at 1Xnm Technology Node

Caption

Figure 2: (a) Thermal stability factor of MTJs with the new structure compared with those with the conventional structure. (b) Writing current of MTJs with the new structure compared with those with the conventional structure.

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Credit: IEEE & Tohoku University

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Credit: IEEE & Tohoku University

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