Development of Durable MTJ Under Harsh Environment for STT-MRAM at 1Xnm Technology Node (IMAGE)

Tohoku University

Development of Durable MTJ Under Harsh Environment for STT-MRAM at 1Xnm Technology Node

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Figure 1: (a) The developed MTJ structure in this study compared with (b) the conventional MTJ structure.

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Credit: Tohoku University

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Credit: Tohoku University

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