Engineering Wafer-Scale Boron Carbon Nitride through Molecular Precursor Chemistry (IMAGE)

Graduate School of Engineering, The University of Tokyo

Engineering Wafer-Scale Boron Carbon Nitride through Molecular Precursor Chemistry

Caption

Schematic illustration of the synthesis of monolayer boron carbon nitride (BCN) using precisely controlled molecular precursors, monomethylamine borane (MMAB) and ammonia borane (AB). Chemical vapor deposition enables the oriented growth and coalescence of BCN domains into continuous semiconductor films (top). The lower panel presents a cross-sectional electron microscopy image showing atomic-scale structural details at a Ni/Cu(111) interface.

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Vincent Tung, The University of Tokyo

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