fig 1 (IMAGE)

Compuscript Ltd

fig 1

Caption

 

Figure 1. Schematic of a high-power CO2 laser system for EUV lithography. A CO2 seed laser is amplified and optically transported before being focused on the target to generate extreme ultraviolet radiation for lithographic exposure.

Credit

OEA

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Credit must be given to the creator.

License

CC BY

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