Figure 1. Schematic of EUV lithography and the proposed mask optimization framework (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 1. Schematic of EUV lithography and the proposed mask optimization framework

Caption

Figure 1. Schematic of EUV lithography and the proposed mask optimization framework. a, Schematic overview of the EUV lithography system. b, The proposed full-chip EUV curvilinear mask optimization framework consisting of deep-learning-enabled surrogate models and approximated gradient calculation for inverse optimization.

Credit

Shiyuan Liu et al.

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CC BY

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