Figure 2. Mask optimization results and accuracy verification on a typical BigMaC pattern (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 2. Mask optimization results and accuracy verification on a typical BigMaC pattern

Caption

Figure 2. Mask optimization results and accuracy verification on a typical BigMaC pattern. a, Convergence curve of the normalized cost function during three-stage optimization. b, Comparison of mask patterns before and after optimization. c, Comparison of original, target, and optimized wafer contours. Critical dimension measurements validate the high accuracy of the framework.

Credit

Shiyuan Liu et al.

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Credit must be given to the creator.

License

CC BY

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