New Study Resolves Long-standing Debate on Low-Pressure Phase Transitions in HfO₂ (IMAGE)

Hefei Institutes of Physical Science, Chinese Academy of Sciences

New Study Resolves Long-standing Debate on Low-Pressure Phase Transitions in HfO₂

Caption

(a) Representative I-V curves of 5% Y-doped HfO2. (b) The pressure dependence of the resistance. 

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PAN Xiaomei

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