Argonne chemists Jeff Elam and Anil Mane (IMAGE)

DOE/Argonne National Laboratory

Argonne chemists Jeff Elam and Anil Mane

Caption

Argonne chemists Jeff Elam (left) and Anil Mane (right) and colleagues have molecular layer etching that may help develop microelectronics and show the way beyond Moore's Law. Not shown are Matthias Young, Angel Yanguas-Gil, Devika Choudhury and Steven Letourneau.

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Argonne National Laboratory

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