Atom-thin coating developed from NUS CDE –Applied Materials partnership tackles key bottleneck in chip miniaturisation (IMAGE)

National University of Singapore College of Design and Engineering

Atom-thin coating developed from NUS CDE –Applied Materials partnership tackles key bottleneck in chip miniaturisation

Caption

From right: Members of the research team from the Department of Materials Science and Engineering, Prof Silvija Gradečak, Dr M Juvaid, Dr Chung Jing-Yang, and Dr Hippolyte Astier

Credit

College of Design and Engineering, NUS

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CC BY-NC-ND

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