A frame from a simulation video shows a plasma ion (purple) dislodging atoms from a class of extremely thin materials called transition metal dichalcogenides (TMD). (IMAGE)

Princeton University

A frame from a simulation video shows a plasma ion (purple) dislodging atoms from a class of extremely thin materials called transition metal dichalcogenides (TMD).

Caption

A frame from a simulation video shows a plasma ion (purple) dislodging atoms from a class of extremely thin materials called transition metal dichalcogenides (TMD). This material might be an ideal replacement for silicon in computer chips. A layer of molybdenum atoms (blue) is sandwiched between two layers of sulfur (green). The TMD has been coated in oxygen (red) so that when the plasma ion strikes, the sulfur and oxygen bond to form sulfur dioxide. This allows for the removal of the upper layer of sulfur without damaging the molybdenum below. 

Credit

Yury Polyachenko / PPPL

Usage Restrictions

Credit must be given to the creator.

License

CC BY

Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.