Ultrafast laser chemical vapor deposition (ULCVD) of hybrid carbon structures (IMAGE)
Caption
Ultrafast laser chemical vapor deposition (ULCVD) of hybrid carbon structures. a Schematic illustration of the ULCVD process, where femtosecond laser focusing enables selective deposition of carbon either on the exterior or interior of transparent glass substrates. b Optical images of deposited carbon: the left sample shows deposition on the outer glass surface, while the right sample demonstrates deposition in the inner regions (both top and bottom surfaces). c Flow chart of ULCVD. d Schematic illustration of ULCVD: acetylene precursor molecules are introduced near the target surface, followed by femtosecond laser irradiation. Local photophoretic aggregation enhances precursor density at the laser focus, leading to rapid thermal decomposition and carbon recrystallization onto the substrate. e SEM image of the deposited carbon microstructure, showing a porous, entangled network of nanoscale carbon flakes. (Scale bars: 5 μm in the upper panel and 100 nm in the lower panel) f Raman spectrum of the deposited material, exhibiting characteristic D, G, and 2D bands along with a weak RBM peak, indicative of coexisting CNT and LIG domains. g XRD data of the deposited carbon materials: confirming graphitic stacking (2θ ≈ 26°) and enhanced (101) reflections, consistent with a CNT–LIG hybrid carbon phase
Credit
Prof. Seunghwoi Han (Chonnam National University, PhotoniX)
Usage Restrictions
Credit must be given to the creator.
License
CC BY