Shadow‑Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography (IMAGE)

Shanghai Jiao Tong University Journal Center

Shadow‑Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Caption

  • The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.
  • A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.
  • The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.

Credit

Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu.

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License

CC BY-NC-ND

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