Shadow‑Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography (IMAGE)
Caption
- The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.
- A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.
- The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.
Credit
Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu.
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License
CC BY-NC-ND